| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad capable of improving the detection accuracy of polishing rate by suppressing collecting of slurry on a window member, and to provide a polishing pad having no bad influence on polishing performance by preventing the window member alone from projecting out of a main body portion. SOLUTION: This polishing pad P has the pad main body portion 10 and the transparent window member 2 integrally formed on the pad main body 10. The material quality of the window member 2 has a higher grinding property than that of the pad main body 10. On the surface of the pad main body 10 except on the surface of the window member 2, a large number of grooves is formed. The surface of the window member 2 is recessed from the surface of the pad main body 10, and a large number of the grooves is formed on the surface of the pad main body 10 except on the surface of the window member 2. |
