| 摘要 |
PURPOSE:To provide a device and a method for forming a pattern image capable of shortening processing time and reducing a production cost without using a photomask in a lithography technique or an etching technique. CONSTITUTION:This device is provided with a substrate 8 on which the pattern image is formed, a substrate holding means 7 holding the substrate 8, a jetting head 11 arranged on a position opposed to the substrate 8 and jetting liquid resin, a pattern image information inputting means 18 inputting pattern image information to the jetting head 11, and a means for controlling the pattern image forming which makes the liquid resin jetted from the jetting head 11 based on the inputted pattern image information and draws the resin pattern image on the substrate 8. |
