| 摘要 |
PURPOSE: Exposure equipment having a rotary quadruple aperture is provided to increase resolution of a light source and a depth of focus and to form a pattern of a uniform critical dimension, by increasing the quantity of incident light of the light source contributing to formation of the pattern while rotating the aperture. CONSTITUTION: An exposure target, a projection lens(22), a mask(23) having a pattern to be transcribed to the exposure target, a condensing lens(24) and a light control unit for controlling rays of light incident upon the condensing lens are installed in line of exposure equipment. The light control unit has a light interception region and a light transmission region. The light interception region intercepts the light incident upon the condensing lens. The light transmission region transmits the light incident upon the condensing lens, having high resolution.
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