| 摘要 |
PURPOSE: A method for cleaning an electronic device and a substrate using a laser and a vapor phase is provided to simplify a cleaning equipment, reduce a cleaning cost and shorten a cleaning time. CONSTITUTION: Electronic devices and substrates are automatically transferred to a cleaning space. Metals and Natrium/Chemical oxide are removed from the transferred electronic devices and substrates by spraying HCl, HF/H2O or HF/alcohol in a vapor-phase gas state, whereby surfaces of the electronic devices and substrates are finely etched, so as to separate pollutants. The pollutants are discharged to the outside by using a vacuum pump. Pollutants like a micro-contamination, such as particles, organic matters and ionic impurities adsorbed on the electronic devices and substrates are separated by emitting a laser. An inert gas is sprayed to the separated pollutants so as to discharge the pollutants to the outside and remove the pollutants. A vacuum chamber in which a laser is operated and a vacuum chamber in which the cleaning solution can be sprayed in the vapor-phase gas state are commonly used. The laser is a KrF Excimer laser. Otherwise, the laser may be an ArF Excimer laser.
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