| 摘要 |
PURPOSE: Provided are a copolymer resin for ultraviolet(such as KrF or ArF, and so on) photosensitive film, a method for preparing the same, and a photoresist using the same. CONSTITUTION: The copolymer which is represented by formula 3 and has molecular weight of 3,000-100,000, is characterized by comprising mono-methyl cis-5-norbonene-endo-2,3-dicarboxylate monomer. In the formula 3, R represents t-butyl, tetrahydropyranyl, tetrahydrofuranyl or 1-ethoxyethyl, and mole% of x:y:z is (0.1-99%):(0;.1:99%):(0.1:99%). The copolymer is prepared by polymerizing norbornene derivative of formula 8(wherein R is the same as the formula 3), 2-hydroxyethyl-5-norbonene-2-carboxylate of formula 9, maleic anhydride of formula 10, and mono-methyl cis-5-norbonene-endo-2,3-dicarboxylate of formula 11 in the presence of a radical polymerization initiator.
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