发明名称 |
Lithography system |
摘要 |
A lithography system includes a light source producing a light beam directed to a mask located in a mask level and an optical demagnifier for demagnifying by a factor and focusing the beam. The light beam is focused on a converter element for converting the beam in a further beam having a smaller wavelength than UV light. The beam at the mask level has a transversal size smaller than the desired resolution at the object level multiplied by the demagnifying factor.
|
申请公布号 |
US6335783(B1) |
申请公布日期 |
2002.01.01 |
申请号 |
US20000424575 |
申请日期 |
2000.01.07 |
申请人 |
TECHNISCHE UNIVERSITEIT DELFT |
发明人 |
KRUIT PIETER |
分类号 |
G03F7/20;H01J37/305;H01J37/317;H01L21/027;(IPC1-7):G03B27/68;G03B27/54;A61N5/00 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|