发明名称 Methods, complexes, and systems for forming metal-containing films on semiconductor structures
摘要 A method of forming a film on a substrate using Group IVB, VB, or VIB metal complexes. The methods are particularly suitable for the preparation of semiconductor structures using chemical vapor deposition techniques and systems.
申请公布号 US2001055877(A1) 申请公布日期 2001.12.27
申请号 US20010865612 申请日期 2001.05.25
申请人 MICRON TECHNOLOGY, INC. 发明人 VAARTSTRA BRIAN A.
分类号 C23C16/18;H01L21/768;(IPC1-7):H01L21/476 主分类号 C23C16/18
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