发明名称 |
Methods, complexes, and systems for forming metal-containing films on semiconductor structures |
摘要 |
A method of forming a film on a substrate using Group IVB, VB, or VIB metal complexes. The methods are particularly suitable for the preparation of semiconductor structures using chemical vapor deposition techniques and systems.
|
申请公布号 |
US2001055877(A1) |
申请公布日期 |
2001.12.27 |
申请号 |
US20010865612 |
申请日期 |
2001.05.25 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
VAARTSTRA BRIAN A. |
分类号 |
C23C16/18;H01L21/768;(IPC1-7):H01L21/476 |
主分类号 |
C23C16/18 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|