发明名称 Plasma processor, cluster tool, and method of controlling plasma
摘要 While maintaining transferability of a subject to be processed, plasma is made uniform. The plasma processor comprises a member for generating plasma and a member for controlling axial symmetry of the generated plasma. The axial symmetry control member comprises pin conductors movable in Z direction and an insert type gate valve. By approaching the pin conductor to the insert type gate valve and by arranging the pin conductors along an inside shape of the insert gate valve, even in the portion of the insert gate valve, an electric current can be flowed similarly with the portion of the chamber wall. Thereby, current flow can be made uniform.
申请公布号 US2001054484(A1) 申请公布日期 2001.12.27
申请号 US20000739623 申请日期 2000.12.20
申请人 KOMINO MITSUAKI 发明人 KOMINO MITSUAKI
分类号 H01L21/302;C23C16/50;H01J37/32;H01L21/3065;H01L21/31;H05H1/46;(IPC1-7):C23C16/00;H01L21/306 主分类号 H01L21/302
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