发明名称 GAS SUPPLY DEVICE AND TREATING DEVICE
摘要 <p>A shower head structure (22) of a treating device (2) for introducing individually a plurality of material gases and an oxide gas into a treating container (4) from jet holes (32, 34) in a shower head body (28) to apply a specified treatment to an object of treating (W), wherein the shower head body has a space (36) having such a comparatively large capacity that can disperse sufficiently a plurality of gases introduced previously, thereby keeping a high thickness uniformity of a metal-oxide, especially multi-element ferroelectric crystal film and a high element composition uniformity in the film.</p>
申请公布号 WO2001099171(P1) 申请公布日期 2001.12.27
申请号 JP2001005307 申请日期 2001.06.21
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址