| 摘要 |
<p>The present invention relates to a system and method of modifying (660) mask layout data (100) to improve the fidelity of mask manufacture. The system and method include determining (645, 650, 655) the difference between the mask layout design (100) and the mask features (20) as written, and generating sizing corrections (160). The sizing corrections (160) can be used to modify (660) the mask layout data (100), and/or stored in a database (170).</p> |
