| 摘要 |
In a prior art method for cleaning a PVD or CVD reactor, a treatment gas containing fluorine is introduced into the reactor. The aim of the invention is to provide an economical and effective method, which expands upon the prior art, while largely avoiding the formation of toxic substances. To this end, the invention provides that treatment gas containing molecular fluorine is used and the treatment gas undergoes a dissociation while forming atomic fluorine. An inventive device for carrying out said method is characterized by comprising a PVD or CVD reactor with a gas inlet for introducing a treatment gas containing fluorine, whereby a gas discharge device, which is fluidically connected to the reactor, is provided for effecting a gas discharge in a treatment gas containing fluorine. |
