METHOD FOR MANUFACTURING EXPOSURE SUBSTRATE AND METHOD FOR MANUFACTURING PHOTOELECTRIC DEVICE, AND EXPOSURE SUBSTRATE AND PHOTOELECTRIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing an exposure substrate and a method for manufacturing a photoelectric device, and an exposure substrate and a photoelectric device by which the generation of distortion during alignment step can be easily observed, when an exposure substrate and a photoelectric device are manufactured through a projection alignment step using a projection optic system. SOLUTION: Hole patterns 400 as an alignment evaluation pattern are arranged in four corners of a TFT array substrate 10 forming a photoelectric device, through a projection alignment step using a projection optic system. The shape of every hole pattern 400 arranged therein is observed, thereby finding distortion during the alignment step.