MASK, AND PATTERN FORMING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To simplify pattern data as well as to form a narrow pattern beyond the conventional resolving power and to form a fine pattern with enhanced resolution, in relation to a mask and a pattern forming method using the mask. SOLUTION: In the mask comprising a transparent substrate layer which is transparent to light used for exposure and an opaque layer formed on the transparent substrate layer, at least a part of the mask pattern comprises the opaque layer and a phase shift layer disposed only one the edge part of the opaque layer, and a prescribed phase shift is caused between the phase of light passing through the phase shift layer and that of light passing through a shift layer-free part, and the phase shift layer surrounds the periphery of the disclosed part of the transparent substrate layer except the phase shift layer.