发明名称 SEMICONDUCTOR DEVICE HAVING CROSS GATE STRUCTURE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To surely enhance a density of a semiconductor device by suitably simplifying a wiring configuration in the device. SOLUTION: The semiconductor device is constituted by wiring as prescribed at a base array for an embedded cell array/gate array having one constituting unit U including a P-type transistor P1, an N-type transistor N3 disposed as a pair with the transistor P1, a P-type transistor P2 aligned with the transistor P1 to form a P-type transistor row together with the transistor P1, and an N-type transistor N4 disposed as a pair with the transistor P2 to form an N-type transistor row parallel to the P-type transistor row together with the transistor N3 parallel to the transistor N3. The device also comprises a cross gate structure in which a gate wiring part 5 is bonded to a wiring member 6 so that gates of the transistors P1 and N4 are crossed with gates of the transistors P2 and N3 each other.
申请公布号 JP2001358319(A) 申请公布日期 2001.12.26
申请号 JP20000174611 申请日期 2000.06.12
申请人 MITSUBISHI ELECTRIC CORP 发明人 NAKAO HIROOMI
分类号 H01L27/092;H01L21/82;H01L21/8238;H01L27/118;(IPC1-7):H01L27/118;H01L21/823 主分类号 H01L27/092
代理机构 代理人
主权项
地址