| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus which can precisely detect the service life of a microwave-transmitting member composed of quartz glass. SOLUTION: This plasma processing apparatus processes an object to be processed W in a processing chamber 2 maintained in a vacuum atmosphere, by utilizing a plasma generated by having a process gas containing at least fluorine atoms, irradiated with microwaves. The treatment device has a microwave-transmitting member 5, composed of quartz glass for introducing the microwave to the plasma-generating region, a photodetecting means 8 which detects the SiF light emitted, when the member 5 is etched by means of the plasma, and a monitoring means 11 having a function of integrating the luminous intensity of the SiF light detected by means of the photodetecting means 8. |
