| 摘要 |
PROBLEM TO BE SOLVED: To provide a low-cost method for producing a relief image by direct exposure through an integrated mask. SOLUTION: The method for producing a relief image on site includes (a) a step for laminating a material including a first peelable base (1), an image recording layer (2) and an adhesive layer (3) in this order on a UV sensitive material including a base (7) and a UV sensitive layer (6) in such a way that the adhesive layer (3) is laminated on the UV sensitive layer (6), (b) a step for imagewise exposing the image recording layer (2) to form a mask, (c) a step for subjecting the UV sensitive material to flood exposure through the mask and (d) a step for developing the UV sensitive material. The peelable base (1) is removed before the step (b), (c) or (d) and the steps (a)-(d) are carried out within 2 months. |
