发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING THE SAME, METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition giving a resist cured film which is cracked by a shock such as spray, ensures a short removal time and is excellent in adhesion and resolution, and to provide a photosensitive element using the composition, a method for producing a resist pattern using the element and a printed wiring board. SOLUTION: The photosensitive resin composition contains (A) a binder polymer containing styrene or its derivative as a copolymerizable component, (B1) 2,2-bis(4-((meth)acryloxypolyethoxy)phenyl)propane, (B2) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group and at least one urethane bond in one molecule and (C) a photopolymerization initiator. The photosensitive element is obtained by applying and drying the photosensitive resin composition on a substrate. The method for producing a resist pattern using the photosensitive element and the printed wiring board are also provided. |
申请公布号 |
JP2001356476(A) |
申请公布日期 |
2001.12.26 |
申请号 |
JP20000176229 |
申请日期 |
2000.06.13 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
ISHIKAWA TSUTOMU;ICHIKAWA TATSUYA |
分类号 |
G03F7/033;C08F2/44;C08F2/50;C08F290/06;C08F291/00;C08F299/02;C08L25/00;C08L33/00;C08L33/14;C08L71/00;G03F7/027;H05K3/06;H05K3/18 |
主分类号 |
G03F7/033 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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