TRANSFER MASK AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a transfer mask having an extremely high precision of corner squareness of an opening pattern and an extremely high connecting precision. SOLUTION: The method for manufacturing the transfer mask having an opening formed on a thin film supported to a support frame comprises the steps of forming an etching mask layer on the surface of a substrate, and optimizing etching conditions of an etching mask layer so as to obtain good characteristics in both a pattern size and a corner R-value in the case of patterning the mask layer in the same pattern as a desired opening shape by using a lithography technique.