发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device provided with a plurality of protrusions for controlling the thickness of junctions on a backside pattern of an insulation substrate or on a base plate, wherein a thermal stress generated in the junctions around the protrusions can be suppressed, an anti-crack property of the junctions can be increased, and a high reliability can be secured. SOLUTION: The backside pattern of the insulation substrate or the base plate is provided with a plurality of protrusions for controlling the thickness of the junctions between the backside pattern and base plate. An end of each protrusion facing the periphery of the backside pattern is located 1 to 10 mm away from the peripheral edge of the pattern.
申请公布号 JP2001358267(A) 申请公布日期 2001.12.26
申请号 JP20000175084 申请日期 2000.06.12
申请人 MITSUBISHI ELECTRIC CORP 发明人 NISHIBORI HIROSHI;YOSHIHARA KUNIHIRO
分类号 H01L23/40;H01L21/52;H01L25/07;H01L25/18;(IPC1-7):H01L23/40 主分类号 H01L23/40
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