COMPOSITION FOR RESIST REMOVING SOLUTION

摘要

PROBLEM TO BE SOLVED: To provide a composition for a resist removing solution containing at least one selected from the group comprising phosphoric esters each having a perfluoroalkyl group and their amine and ammonium salts as an essential component. SOLUTION: The composition contains a characteristic compound having a perfluoroalkyl group and a phosphoric ester group in the same molecule and produces a superior anticorrosive effect on various metallic wiring materials without lowering resist removing performance in a step for producing a semiconductor device or a liquid crystal device.