PHOTORESIST REMOVER COMPOSITION AND METHOD FOR USING THE SAME

摘要

PROBLEM TO BE SOLVED: To prevent or inhibit the corrosion of Al and to retain superior removing performance. SOLUTION: The objective photoresist remover composition consists essentially of a polar organic solvent of the formula HO-(CnH2nO)m-R (where R is H or a 1-4C alkyl; (n) is an integer of 2-3; and (m) is an integer of 1-3), hydroxylamine, water and a hydroxylamine stabilizer.