| 摘要 |
A semiconductor storage device with high integration is capable of performing high speed access. The semiconductor storage device is constituted in such a way that it causes one contact to be connected with a primary bit-line, further it causes four sub bit-lines to be connected through four bank selection transistor, furthermore, it causes one contact to be connected to a virtual GND line, moreover, it causes two sub bit-lines to be connected through two bank selection transistors. The respective sub bit-lines are arranged in parallel to signal inputted to six bank selection lines, and in parallel to primary bit-line. Two virtual GND lines which are arranged at right and left of the primary bit-line. The memory cell transistor is capable of being selected according to combination of level of the two virtual GND lines. This causes bank selection lines to be reduced, further it causes cell array to be shortened in bit direction, furthermore, it causes cell array area to be reduced.
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