| 摘要 |
<p>PURPOSE:To precisely plot the positional relation of an alignment pattern and a regular pattern, in a pattern edition having the alignment pattern. CONSTITUTION:When the pattern edition having the regular pattern B such as a reticule pattern and a shadow mask pattern, and the alignment patterns A1, A2, and A3, is plotted, at least, the alignment patterns A1, A2, and A3, has plotting, before the regular pattern B is plotted, and the alignment patterns A1, A2, and A3 are superimposed and plotted again, after the regular pattern B is plotted. A relative positional deviation between the alignment pattern fluctuated in dependence on the time of a plotting system while the regular pattern is plotted, and the regular pattern, is almost completely corrected, and moreover, reduction in the positional precision of the plotting fluctuated in dependence on the size of the pattern, can be lessened.</p> |
