发明名称 Depletion compensated polysilicon electrodes
摘要 A capacitor in a semiconductor integrated circuit is fabricated having a fixed charge density introduced near an electrode/dielectric interface. The fixed charge density compensates for the effects of a depletion layer, which would otherwise lower the effective capacitance. By shifting the undesirable effect of the depletion capacitance outside of the operating voltage range, the capacitor is effectively converted to an accumulation mode. The fixed charge density is preferably introduced by a plasma nitridation process performed prior to formation of the capacitor dielectric.
申请公布号 US6333536(B1) 申请公布日期 2001.12.25
申请号 US20000702584 申请日期 2000.10.31
申请人 MICRON TECHNOLOGY, INC. 发明人 IYER RAVI;TRAN LUAN;TURNER CHARLES L.
分类号 H01L21/02;H01L21/768;H01L21/8242;(IPC1-7):H01L27/108 主分类号 H01L21/02
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