| 摘要 |
PROBLEM TO BE SOLVED: To provide a process for producing a highly polymerized polymethylsilsesquioxane which is soluble in various solvents, is excellent in storage stability, and can be suitably used as a film for preventing a stain and marring of various articles and as a semiconductor material. SOLUTION: The process for producing the polymethylsilsesquioxane comprises (I) a step of hydrolyzing an organosilane represented by CH3Si(OR2)3 (wherein R2 is a 1-3C alkyl) in a solvent mixture comprising water containing an acid in an amount of 0.0001-0.1 mmol/g and an alcohol represented by R1OH (wherein R1 is a 1-4C alkyl), (II) a step of bringing the hydrolyzed organosilane obtained in the step (I) into contact with an organic solvent and a strong acid which will separate into two layers after contact with the hydrolyzate, thus allowing the hydrolyzate to condense, and (III) a step of polymerizing in an alkaline atmosphere the condensation product obtained in the step (II).
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