发明名称 COMPOSITE VAPOR DEPOSITING MATERIAL AND ITS PRODUCTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a composite vapor depositing material by which a vapor deposited film in which the composition in the initial stage of vapor deposition is composed of silver or an alloy of silver and aluminum, and the composition in the final stage of vapor deposition is composed of a low vapor pressure metal or metallic compound hard to be evapoated compared with the case of aluminum can be obtained by single vapor deposition operation. SOLUTION: This vapor depositing material has a composite structure provided with an exterior material of silver or an exterior material on the outside of silver and an exterior material on the inside of aluminum, and the axial region is arranged with a low vapor pressure metal or metallic compound hard to be evaporated compared with the case of aluminum.
申请公布号 JP2001355059(A) 申请公布日期 2001.12.25
申请号 JP20000371071 申请日期 2000.12.06
申请人 HITACHI METALS LTD 发明人 FURUICHI SHINJI
分类号 C23C14/24;C23C14/06;C23C14/14;(IPC1-7):C23C14/24 主分类号 C23C14/24
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