发明名称 INSPECTION APPARATUS AND METHOD
摘要 PROBLEM TO BE SOLVED: To facilitate the processing of coordinate transformation among a plurality of coordinate systems on an inspection apparatus and to accurately measure errors, even in the case where objects to be inspected are brought in from a plurality of directions for accurately measuring errors, etc., which are inherent in the inspection apparatus. SOLUTION: When relating a mechanical coordinate system with a base 1 as the reference, a stage coordinate system with the reference point of a stage 2 for inspection as the origin, a camera coordinate system with the image pickup range of a CCD camera 4 as the reference, and a wafer coordinate system with the center of a semiconductor wafer 101 the origin to each other, transformation processing including a transformation matrix RT, which corresponds to the rotation of the semiconductor wafer 101 by a transfer mechanism 3 is performed to pick up the image of any point P in the wafer coordinate system on the semiconductor wafer 101 by the CCD camera 4.
申请公布号 JP2001349848(A) 申请公布日期 2001.12.21
申请号 JP20000175890 申请日期 2000.06.12
申请人 SONY CORP 发明人 YAMANE AKIHIKO
分类号 G01B11/00;G01B11/24;G01B11/30;G01N21/956;G06T1/00 主分类号 G01B11/00
代理机构 代理人
主权项
地址