发明名称 |
DEVICE FOR INSPECTING DOSE UNIFORMITY IN ION IMPLANTATION |
摘要 |
PROBLEM TO BE SOLVED: To provide a device for confirming dose uniformity in ion implantation, capable of accurately measuring the dose with simple constitution. SOLUTION: This device is provided with an aperture plate 2 irradiated with ion beams from an ion beam irradiator 5; a Faraday cup 4 disposed behind a hole 3 opened in the aperture plate 2, to detect a beam current generated by an ion beam incident through the hole 3; and an arithmetic circuit 10 connected to the Faraday cup 4 to measure the dose which is a total charge quantity. The arithmetic circuit is provided with a first integrator 12 and a second integrator 13 for integrating the beam current I flowing from the detector 4; a switching circuit 11 for alternately switching the first integrator 12 and the second integrator 13; and a computer 22 for computing the sum of the integrated values of the first integrator 12 and second integrator 13.
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申请公布号 |
JP2001351553(A) |
申请公布日期 |
2001.12.21 |
申请号 |
JP20000169532 |
申请日期 |
2000.06.06 |
申请人 |
TOKYO CATHODE LABORATORY CO LTD |
发明人 |
YASAKA MITSUO;TAKESHITA MASAYOSHI |
分类号 |
G21K5/04;H01J37/04;H01J37/317;H01L21/265;(IPC1-7):H01J37/04 |
主分类号 |
G21K5/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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