发明名称 DEVICE FOR INSPECTING DOSE UNIFORMITY IN ION IMPLANTATION
摘要 PROBLEM TO BE SOLVED: To provide a device for confirming dose uniformity in ion implantation, capable of accurately measuring the dose with simple constitution. SOLUTION: This device is provided with an aperture plate 2 irradiated with ion beams from an ion beam irradiator 5; a Faraday cup 4 disposed behind a hole 3 opened in the aperture plate 2, to detect a beam current generated by an ion beam incident through the hole 3; and an arithmetic circuit 10 connected to the Faraday cup 4 to measure the dose which is a total charge quantity. The arithmetic circuit is provided with a first integrator 12 and a second integrator 13 for integrating the beam current I flowing from the detector 4; a switching circuit 11 for alternately switching the first integrator 12 and the second integrator 13; and a computer 22 for computing the sum of the integrated values of the first integrator 12 and second integrator 13.
申请公布号 JP2001351553(A) 申请公布日期 2001.12.21
申请号 JP20000169532 申请日期 2000.06.06
申请人 TOKYO CATHODE LABORATORY CO LTD 发明人 YASAKA MITSUO;TAKESHITA MASAYOSHI
分类号 G21K5/04;H01J37/04;H01J37/317;H01L21/265;(IPC1-7):H01J37/04 主分类号 G21K5/04
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