发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing apparatus wherein a light shielding device can be effectively cooled without generating fluctuation of air on an optical path, change and irregularity of illuminance in a short time which are to be caused by the fluctuation of air are eliminated, manufacturing factors of imperfect elements are excluded, an apparatus operation rate is increased and the apparatus operation cost can be reduced. SOLUTION: Cooling air is supplied to a space surrounding a shutter 10 which operates shielding and projecting a light from a light source lamp 9 by using a cooler 14 and a blower 15 which are controlled by controlling parts 17, 17, respectively, and the shutter 10 is cooled. When the cooling is performed, the blowing amount and the temperature of cooling air are controlled in accordance with a light projecting state and a light shielding state of the shutter 10, the light shielding state holding time and the input power to the lamp 9, and the shutter 10 is cooled effectively. When cooling is performed in the light projecting state (exposure treatment state) of the shutter, the blowing amount of cooling air is reduced, and the fluctuation of air on an optical path is prevented from occurring.
申请公布号 JP2001351850(A) 申请公布日期 2001.12.21
申请号 JP20000171439 申请日期 2000.06.08
申请人 CANON INC 发明人 NAKAMURA HAJIME
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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