| 摘要 |
PROBLEM TO BE SOLVED: To easily surely enhance the accuracy of wave aberration of an optical system to be inspected. SOLUTION: In the aberration measureming method, a negative for aberration measurement, having a test pattern in the view field of the optical system to be inspected, is arranged and a pinhole plate is arranged in between the test pattern and the optical system, so that an aberration image formed on the image surface of the optical system by a light beam for measurement having passed the optical system to be inspected is detected, the detected aberration image is referred and the shift distribution from the ideal position of a conjugate point of each mark of the test pattern is obtained. By setting the relationship between the distance from the test pattern to the pinhole plate and the diameter of the pinhole, so that both of geometrical optics expansion and diffraction expansion of the light beam for measurement are to be suppressed, and unnecessary reduction in the pinhole diameter is avoided.
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