| 摘要 |
There is disclosed a method of manufacturing a micromechanical device. The method comprises the steps of: (a) etching a substrate (1), having a mask (2) thereon, through an opening in the mask to a desired depth to form a trench (6) having a side wall (4) and a base (5) in the substrate (1); (b) depositing a layer of a protecting substance (7) on the exposed surfaces of the substrate and mask; (c) selectively removing the protecting substance (7) from the base (5); and (d) etching the base (5) using a fluorine-containing etchant. Also disclosed is a micromechanical device formed by the method and an apparatus for manufacturing the micromechanical device. |
