METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method by which problem (deterioration of dimensional accuracy) caused by halation and interference due to light reflected from a substrate is solved and a a fine high accuracy pattern is formed even on a substrate having a high reflectance, a substrate with a transparent film or the like. SOLUTION: An antireflection film in which an upper layer film comprises an organic film acting as an interference film to light for exposure and a lower layer film is a light shielding film having a higher rate of absorption of light for exposure than the upper layer film is formed between a substrate to be worked and a resist film.