发明名称 |
DOUBLE PASS DOUBLE ETALON SPECTROMETER |
摘要 |
PROBLEM TO BE SOLVED: To provide an ETALON-based spectrometer. SOLUTION: In a preferred embodiment of a first double pass ETALON-based spectrometer, a second ETALON suitable to a first double pass ETALON is used to generated an extremely precise fringe data. The spectral component of a diffused beam is angularly separated when transmitted through the ETALON. A retro reflector reflects and returns the transmitted component through the ETALON. The spectral component transmitted twice is advanced through the second ETALON and converged onto a light detector that is a photodiode array in a second preferred embodiment. The spectrometer can generate the extremely precise fringe data with an extremely compact size and allows a band width measurement accompanied by a precision necessary for microlithography for bothΔλFWTH andΔλ95.
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申请公布号 |
JP2001349781(A) |
申请公布日期 |
2001.12.21 |
申请号 |
JP20010103889 |
申请日期 |
2001.02.26 |
申请人 |
CYMER INC |
发明人 |
SMITH SCOTT T;ERSHOV ALEXANDER I;BUCK JESSE D |
分类号 |
G01B9/02;G01J3/26;G01J3/36;(IPC1-7):G01J3/26 |
主分类号 |
G01B9/02 |
代理机构 |
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地址 |
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