发明名称 DOUBLE PASS DOUBLE ETALON SPECTROMETER
摘要 PROBLEM TO BE SOLVED: To provide an ETALON-based spectrometer. SOLUTION: In a preferred embodiment of a first double pass ETALON-based spectrometer, a second ETALON suitable to a first double pass ETALON is used to generated an extremely precise fringe data. The spectral component of a diffused beam is angularly separated when transmitted through the ETALON. A retro reflector reflects and returns the transmitted component through the ETALON. The spectral component transmitted twice is advanced through the second ETALON and converged onto a light detector that is a photodiode array in a second preferred embodiment. The spectrometer can generate the extremely precise fringe data with an extremely compact size and allows a band width measurement accompanied by a precision necessary for microlithography for bothΔλFWTH andΔλ95.
申请公布号 JP2001349781(A) 申请公布日期 2001.12.21
申请号 JP20010103889 申请日期 2001.02.26
申请人 CYMER INC 发明人 SMITH SCOTT T;ERSHOV ALEXANDER I;BUCK JESSE D
分类号 G01B9/02;G01J3/26;G01J3/36;(IPC1-7):G01J3/26 主分类号 G01B9/02
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