发明名称 STRUCTURE EVALUATING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES, AND RECORDING MEDIUM
摘要 An initial estimated value of process conditions is set to estimate the structure of elements of a semiconductor device by a process simulator, and a predicted one of the measured physical value is computed. By comparing the measured value of the physical value of the element of the semiconductor device by an optical evaluation method and the theoretical computed value with each other, e.g., by utilizing the quick sedimentation method, there is determined a probable structure of the element of the semiconductor device measured. By utilizing this result, it is possible to correct the process conditions in a process for an element of another semiconductor device.
申请公布号 WO0197267(A1) 申请公布日期 2001.12.20
申请号 WO2001JP05161 申请日期 2001.06.15
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.;NOZAWA, KATSUYA;SAITOH, TOHRU;KUBO, MINORU;KANZAWA, YOSHIHIKO 发明人 NOZAWA, KATSUYA;SAITOH, TOHRU;KUBO, MINORU;KANZAWA, YOSHIHIKO
分类号 H01L21/205;H01L21/66;(IPC1-7):H01L21/205;H01L21/365;H01L21/02 主分类号 H01L21/205
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