发明名称 Scanning tip production process for scanning probe microscope, involves exposing material such as photosensitive resist applied on carrier, through a mask of specific shape at certain angle
摘要 A carrier is positioned on a mask of specific shape, such that the exposure section of mask correlates to the tip to be produced or repaired. A material, such as a photosensitive resist applied on the carrier, is exposed through the mask at certain angle, so that the material is hardened and the unexposed material is removed. The carrier with the tip and the mask are then separated from each other. Independent claims are also included for the following: (a) Probe for use in scanning scope microscopy; (b) Usage method of tip; (c) Usage method of probe.
申请公布号 DE10027060(A1) 申请公布日期 2001.12.20
申请号 DE2000127060 申请日期 2000.06.05
申请人 NANOSURF AG, LIESTAL 发明人 HOWALD, LUKAS DR.;SCANDELLA, LORIS DR.;STAUFER, URS DR.;AKIYAMA, TERUNOBU DR.
分类号 G01Q70/16;G01Q70/14;G21K7/00;(IPC1-7):G12B21/06;B81C3/00;G03F7/00;B82B3/00 主分类号 G01Q70/16
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