BI-POTENTIAL MASK TYPE CRT,申请号KR20000032521-传众专利搜索

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发明名称	BI-POTENTIAL MASK TYPE CRT
摘要
申请公布号	KR20010111837(A)	申请公布日期	2001.12.20
申请号	KR20000032521	申请日期	2000.06.13
申请人	SAMSUNG SDI CO., LTD.	发明人	HWANG, YONG SIK
分类号	(IPC1-7):H01J29/06	主分类号	(IPC1-7):H01J29/06
代理机构		代理人
主权项
地址

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