METHOD AND DEVICE FOR TREATING THIN LAYERS OF AMORPHOUS SILICON,申请号KR1020017012898-传众专利搜索

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发明名称	METHOD AND DEVICE FOR TREATING THIN LAYERS OF AMORPHOUS SILICON
摘要
申请公布号	KR20010112417(A)	申请公布日期	2001.12.20
申请号	KR1020017012898	申请日期	2001.10.09
申请人		发明人
分类号	H01L21/268	主分类号	H01L21/268
代理机构		代理人
主权项
地址

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