发明名称 MASK FOR EXPOSURE
摘要 <p>PROBLEM TO BE SOLVED: To provide a liquid crystal spatial light modulator as a mask for exposure capable of accurately forming the desired mask pattern, even if making design rule to be more minute makes progress. SOLUTION: Reticles 21-23, each comprising a liquid crystal, are stacked to form the liquid crystal spatial optical modulator 2. At this time, the reticles 22, 23 are disposed on the reticle 21 closest to a wafer 6, in such a way that a region present between segments (pixels) of the reticle 21 and causing leakage of light and segments (pixels) of the reticles 22, 23 overlap each other.</p>
申请公布号 JP2001343736(A) 申请公布日期 2001.12.14
申请号 JP20000162530 申请日期 2000.05.31
申请人 NKK CORP 发明人 NISHIGAYA TAKEHIKO
分类号 G03F1/00;G03F1/68;H01L21/027;(IPC1-7):G03F1/08 主分类号 G03F1/00
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