| 摘要 |
PROBLEM TO BE SOLVED: To provide a low-cost photomask, which enables easy modification of a defective part, having proper balance of sensitivity, resolution, etc., less liable to affect the environment and used for patternwise exposure in a photolithographic step, and to provide a method for producing the photomask, a photomask material and a photosensitive transfer material for manufacturing the photomask material. SOLUTION: The photomask material is obtained, by disposing a photosensitive layer containing at least a colorant having absorption in the ultraviolet region and capable of forming an image with near ultraviolet light or visible light on a transparent substrate. The photomask is produced, by exposing the photosensitive layer of the photomask material with near ultraviolet light or visible light and developing the layer so as to form an image. The photosensitive transfer material is obtained, by disposing the photosensitive material on a temporary base. |
