| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method and jig for simple mask alignment by which a resist pattern can be formed at a low cost. SOLUTION: When an epitaxial wafer 2 coated with a resist 1 and a photomask 6 are placed on the substrate fixing base 22 of the simple mask alignment jig 20 and, at the same time, two sides of the substrate 2 and mask 6 are aligned with the orthogonal two internal wall surfaces 21a and 21b of a projection 21, the photomask 6 can be aligned with the wafer 2 at a low cost in a short time without using any photomask position adjusting device and, in addition, a resist pattern 10 can be formed by exposing the photoresist 1 to light.</p> |
