发明名称 METHOD FOR MANUFACTURING TRANSFER SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a transfer substrate having a release layer such that the release layer does not peel in the succeeding processes after the release layer is formed. SOLUTION: The method includes a process of applying a coating type insulating film on an insulating substrate to cover the side faces of the insulating substrate, a process of decreasing the film thickness of the coating film formed on the side face of the insulating substrate, a process of heating and hardening the coating film to form a release film layer, a process of forming a transparent conductive layer on the release layer and a process of forming an adhesive layer on the transparent conductive layer.
申请公布号 JP2001343516(A) 申请公布日期 2001.12.14
申请号 JP20000161794 申请日期 2000.05.31
申请人 KYODO PRINTING CO LTD 发明人 FURUKAWA TADAHIRO;MURAKAMI AKIYOSHI;BETSUMIYA ICHIRO
分类号 G02B5/20;G02F1/1335 主分类号 G02B5/20
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