发明名称 ELECTRODE STRUCTURE AND ITS MANUFACTURING METHOD, ELECTRON-OPTICAL-SYSTEM ARRAY, CHARGED PARTICLE BEAM EXPOSURE APPARATUS, AND MANUFACTURING METHOD OF DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an electronic-optical-system array having a plurality of electron lenses. SOLUTION: This electronic-optical-system array has electrode structures 1, 2, and 3 that are arranged along the path of a plurality of charged particle beams, and have a plurality of openings in the path of the plurality of charged particle beams. At least the electrode structure 2 is equipped with a substrate 2a that has the plurality of openings for allowing each of the plurality of charged particle beams to pass, and a plurality of electrodes 10 extending toward the periphery of the plurality of openings from the side of the plurality of openings. In the substrate 2a, at least the surface has an insulation property.
申请公布号 JP2001345261(A) 申请公布日期 2001.12.14
申请号 JP20010074737 申请日期 2001.03.15
申请人 CANON INC 发明人 ONO HARUTO;SHIMADA YASUHIRO;YAGI TAKAYUKI;MAEHARA HIROSHI
分类号 G03F7/20;G21K1/087;H01J9/14;H01J37/04;H01J37/12;H01J37/305;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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