MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND MANUFACTURING APPARATUS OF SEMICONDUCTOR

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor device which does not need an elaborate designation of a gas mixing chamber, and to provide a manufacturing apparatus of a semiconductor. SOLUTION: The manufacturing apparatus for a semiconductor comprises; connecting a piping 4 for supplying a raw material gas of ruthenium which was vaporized from a liquid raw material of ruthenium, to a piping 5 for supplying a gas including oxygen at upstream of the gas mixing chamber 6, to mix the raw material gas of ruthenium and the gas including oxygen atoms (for example, oxygen (O2) or ozone (O3)) ahead of their approach to the gas mixing chamber 6.