| 摘要 |
PROBLEM TO BE SOLVED: To solve such problems that when a photoresist is half exposed by decreasing the power of the recording light so as to provide an optical master disk having a pattern with different depth, it is difficult to obtain stability and reproducibility of the depth and width of the pattern. SOLUTION: A photoresist film 2 is formed on a substrate 1, exposed according to information signals and developed to form a desired photoresist pattern, then the substrate in a part where no photoresist film is present is etched to form a pattern on the substrate. Then the photoresist film is removed and another photoresist film 3 is again formed on the substrate where the aforementioned pattern is formed, exposed according to information signals while exposed in the whole area where the pattern is formed, and developed to form a desired photoresist pattern.
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