发明名称 POLYESTER BASE AND SILVER HALIDE PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a polyester base, superior in suitability with respect to film cutting (trimming and opening of a notch) in a processing laboratory and also in planarity and adhesion, and to provide a silver halide photosensitive material. SOLUTION: The polyester base has 5-18 kg/mm2 breaking strength in both transverse direction(TD) and longitudinal direction (MD), and 20-100 g net-tearing strength in both the TD and MD.
申请公布号 JP2001343728(A) 申请公布日期 2001.12.14
申请号 JP20000162437 申请日期 2000.05.31
申请人 FUJI PHOTO FILM CO LTD 发明人 HASHIMOTO NARIKAZU
分类号 G03C1/795;C08G63/189;C08J5/18;C08J7/04;(IPC1-7):G03C1/795 主分类号 G03C1/795
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