| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a film forming method by sputtering in which a film, in particular a reflection film having a desired reflectivity is stably formed by sputtering over a long time, having a superior workability, durability and a high photoelectric conversion efficiency, and to provide a manufacturing method of a photovoltaic device by using the film. SOLUTION: The film forming method by sputtering which forms a film on a substrate by introducing a sputtering gas in a film forming room, includes forming a reflection layer having a predetermined reflectivity on the above substrate, by adjusting a H2O partial pressure in the atmosphere in the above film forming room to a predetermined condition.</p> |
