发明名称 SOFT X-RAY MASK ALIGNMENT SYSTEM
摘要 An alignment system for a soft X-ray lithographic system for aligning a mask with a substrate to be printed with a pattern including a first registration means on the mask and second registration means on the substrate; one of the registration means being a first soft X-ray absorber means of a predetermined form; the other registration means being a second soft X-ray absorber means having a space in it with the same predetermined form, and one of the registration means being carried over a soft X-ray transparent registration window on the mask, the other registration means being carried over a soft X-ray transparent registration window on the substrate.
申请公布号 US3742229(A) 申请公布日期 1973.06.26
申请号 USD3742229 申请日期 1972.06.29
申请人 MASSACHUSETTS INSTITUTE OF TECHNOLOGY,US 发明人 SMITH H,US;SPEARS D,US;STERN E,US
分类号 G03B42/02;C23F1/00;G03F1/00;G03F1/16;G03F9/00;H01L21/00;H01L21/027;H05G1/02;H05K3/00;(IPC1-7):G01N21/34 主分类号 G03B42/02
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