发明名称 |
SOFT X-RAY MASK ALIGNMENT SYSTEM |
摘要 |
An alignment system for a soft X-ray lithographic system for aligning a mask with a substrate to be printed with a pattern including a first registration means on the mask and second registration means on the substrate; one of the registration means being a first soft X-ray absorber means of a predetermined form; the other registration means being a second soft X-ray absorber means having a space in it with the same predetermined form, and one of the registration means being carried over a soft X-ray transparent registration window on the mask, the other registration means being carried over a soft X-ray transparent registration window on the substrate.
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申请公布号 |
US3742229(A) |
申请公布日期 |
1973.06.26 |
申请号 |
USD3742229 |
申请日期 |
1972.06.29 |
申请人 |
MASSACHUSETTS INSTITUTE OF TECHNOLOGY,US |
发明人 |
SMITH H,US;SPEARS D,US;STERN E,US |
分类号 |
G03B42/02;C23F1/00;G03F1/00;G03F1/16;G03F9/00;H01L21/00;H01L21/027;H05G1/02;H05K3/00;(IPC1-7):G01N21/34 |
主分类号 |
G03B42/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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