发明名称 ELECTRON BEAM GENERATOR AND METHOD OF ELECTRON BEAM IRRADIATION
摘要 An electron beam generator (100) comprises an electron gun (12) for emitting an electron beam, an electron optics system (18) for adjusting the electron beam, a Z-stage (20) for carrying an object (30), and a stage control (34) for moving the Z-stage (20) in the direction of electron beam irradiation. The Z-stage (20) is preferably moved so that the distance between the object (30) and a case (10) enclosing the electron optics system (18) may become substantially equal to the distance between the case (10) with the electron optics system (18) calibrated and a target marker (50).
申请公布号 WO0195364(A1) 申请公布日期 2001.12.13
申请号 WO2001JP04872 申请日期 2001.06.08
申请人 ADVANTEST CORPORATION;KINTAKA, AKIRA;SEKINE, MASATO;IWAI, TOSHIMICHI 发明人 KINTAKA, AKIRA;SEKINE, MASATO;IWAI, TOSHIMICHI
分类号 G01B15/00;G21K5/04;G21K5/10;H01J37/20;H01J37/21;H01L21/66;(IPC1-7):H01J37/20 主分类号 G01B15/00
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