发明名称 |
ELECTRON BEAM GENERATOR AND METHOD OF ELECTRON BEAM IRRADIATION |
摘要 |
An electron beam generator (100) comprises an electron gun (12) for emitting an electron beam, an electron optics system (18) for adjusting the electron beam, a Z-stage (20) for carrying an object (30), and a stage control (34) for moving the Z-stage (20) in the direction of electron beam irradiation. The Z-stage (20) is preferably moved so that the distance between the object (30) and a case (10) enclosing the electron optics system (18) may become substantially equal to the distance between the case (10) with the electron optics system (18) calibrated and a target marker (50).
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申请公布号 |
WO0195364(A1) |
申请公布日期 |
2001.12.13 |
申请号 |
WO2001JP04872 |
申请日期 |
2001.06.08 |
申请人 |
ADVANTEST CORPORATION;KINTAKA, AKIRA;SEKINE, MASATO;IWAI, TOSHIMICHI |
发明人 |
KINTAKA, AKIRA;SEKINE, MASATO;IWAI, TOSHIMICHI |
分类号 |
G01B15/00;G21K5/04;G21K5/10;H01J37/20;H01J37/21;H01L21/66;(IPC1-7):H01J37/20 |
主分类号 |
G01B15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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