发明名称 CONSTRUCTIVE NANOLITHOGRAPHY
摘要 <p>On a patterned organic methyl-terminated monolayer or multilayer film self-assembled on solid substrate, a pattern consisting of a site-defined surface chemical modification non-destructively inscribed in the organic monolayer or multilayer by means of an electrically biased conducting scanning probe device, stamping device and/or liquid metal or metal alloy or any other device that can touch the organic monolayer or multilayer surface and inscribe therein a chemical modification pattern upon application of an electrical bias. An nanoshuchere composed of a conductive material, e.g. metal, is created on top or in between said monolayer or multilayer.</p>
申请公布号 WO0161330(A3) 申请公布日期 2001.12.13
申请号 WO2001IL00152 申请日期 2001.02.19
申请人 YEDA RESEARCH AND DEVELOPMENT CO. LTD.;SAGIV, JACOB;MAOZ, RIVKA;COHEN, SIDNEY, R.;FRYDMAN, ELI 发明人 SAGIV, JACOB;MAOZ, RIVKA;COHEN, SIDNEY, R.;FRYDMAN, ELI
分类号 B82B3/00;G12B21/08;(IPC1-7):B82B3/00;G11B9/00 主分类号 B82B3/00
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