发明名称 Semiconductor apparatus and manufacturing method therefor
摘要 A semiconductor apparatus and method for making the semiconductor apparatus are provided. The semiconductor memory device can include functional circuit blocks (100) having a multi-layer wiring structure for providing electrical connections between device elements within functional circuit blocks (100). Multi-layer wiring structure can include a wiring layer (M2) disposed in a M2 wiring layer horizontal track (120) and a M2 wiring layer vertical track (122). M2 wiring layer horizontal track (120) provides electrical connections by using wiring layer (M2) disposed in a horizontal direction and M2 wiring layer vertical track (122) provides electrical connections by using wiring layer (M2) disposed in a vertical direction. A wiring layer (M1) can form electrodes having electrical connections to diffusion regions of the device elements in functional circuit blocks (100). Wiring layer (M1) can have a higher sheet resistance and higher melting point than wiring layer (M2).
申请公布号 US2001050381(A1) 申请公布日期 2001.12.13
申请号 US20010850254 申请日期 2001.05.07
申请人 KIMOTO HISAMITSU 发明人 KIMOTO HISAMITSU
分类号 H01L21/3205;H01L21/768;H01L21/82;H01L21/822;H01L21/8242;H01L23/52;H01L23/522;H01L27/04;H01L27/10;H01L27/108;(IPC1-7):H01L21/82 主分类号 H01L21/3205
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